Ion Implantation and Annealing Applications, Science and Technology, Gebunden
Ion Implantation and Annealing Applications, Science and Technology
Buch
- Contributions from IIT School, Edition 2024
Item has not been released yet, probable delivery date is 3.2.2026.You can order the title now. It will be dispatched to you as soon as it is available.
Current price: EUR 251.89
Shipping
(United States of America): EUR 19.90
- Publisher:
- Wilfried Lerch, Michael Current
- Publisher:
- Springer-Verlag GmbH, 02/2026
- Binding:
- Gebunden
- Language:
- Englisch
- ISBN-13:
- 9783032100078
- Item number:
- 12467866
- Volume:
- 8 Pages
- other:
- VI, 8 p. 424 illus., 14 illus. in color.
- Release date:
- 3.2.2026
- Series:
- Topics in Applied Physics - volume 156
- Note
-
Caution: Product is not in German language
Blurb
This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.
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Ion Implantation and Annealing Applications, Science and Technology
Current price: EUR 251.89
