Atomic Layer Deposition of Nanostructured Materials
Atomic Layer Deposition of Nanostructured Materials
Buch
- Herausgeber: Nicola Pinna, Mato Knez
- Wiley-VCH, 11/2011
- Einband: Gebunden
- Sprache: Englisch
- ISBN-13: 9783527327973
- Bestellnummer: 9554998
- Umfang: 464 Seiten
- Sonstiges: 132 schwarz-weiße und 43 farbige Abbildungen, 7 schwarz-weiße Tabellen
- Copyright-Jahr: 2011
- Gewicht: 1032 g
- Maße: 254 x 182 mm
- Stärke: 28 mm
- Erscheinungstermin: 23.11.2011
Achtung: Artikel ist nicht in deutscher Sprache!
Beschreibung
Clearly structured, the introductory part of this first book on ALD provides a great insight into all aspects of the technique, while the second part focuses on nanomaterials and fields of application. As a result, readers and users are led from the fundamental processes and uses of the technique to building nanostructures in various important fields of academic and industrial significance.Inhaltsangabe
PART 1: INTRODUCTION TO ATOMIC LAYER DEPOSITION (ALD)General Introduction to ALD and New Challenges
Theroretical Modeling of ALD Processes
New Chemical Approaches to ALD
Polymer and Hybrid ALD (MLD)
Low Temperature ALD Processes
PART 2: NANOSTRUCTURES BY ATOMIC LAYER DEPOSITION
ALD in Microelectronics
Patterning and Linear Structures
Coating of High Aspect Ratio Structures
Coatings of Nanoparticles
Coatings of Soft Materials
Coatings of Carbon Nanotubes
Inverse Opals and Photonics
Optical Nanolaminates
ALS on Biological Materials
Klappentext
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.